Silicon trichloride is a product with a purity of over 99.99%.The largest amounts of silicon trichloride in its ultrapure form are used in the production of polysilicon, as well as for chemical vapour deposition of epitaxial layers of silicon or silicon carbide in the semiconductor industry or in electronics.
After purification to >6N quality, silicon trichloride is a precursor of polysilicon for photovoltaic arrays or semiconductor applications. Silicon trichloride is an excellent gaseous precursor in the production of silicon layers. The dominant path during deposition is (a) the chemisorption of *SiCl2 on the silicon surface and desorption of hydrogen chloride from the silicon surface: SiHCl3 → HCl + *SiCl2 and (b) the reduction of *SiCl2 by hydrogen: *SiCl2 + H2 → Si + 2HCl. Ultrapure silicon trichloride is also used the production of silicon carbide epitaxial layers.
At a normal temperature and pressure, silicon trichloride is a liquid with a melting point of -126.5°C and a boiling point of 31.5-33°C. Its density is greater than the density of water (1.33-1.35 g/cm3) at 20°C and it has a moderate (dynamic) viscosity of 0.33 mPa.s at 20°C. It is highly volatile with a vapour pressure of 72,200 Pa at 22.5°C.
The substance is classified as extremely flammable based on its flash point, <-19.5°C, and boiling point, 31.5-33°C. It is decomposed by water to hydrochloric acid and hydrogen. This reaction occurs very violently. In moist conditions, the product is corrosive to metals and tissues. It is miscible with benzene, chloroform, carbon tetrachloride, ether and heptane. At a standard temperature and pressure, it has the form of a transparent liquid.
PCC Rokita SA is one of the largest chemical companies in Poland as well as Central and Eastern Europe. Its activity includes the production of chloroalkali, polyether polyols, polyalkylene glycols and phosphorus derivatives.
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